Decoration of multilayer graphene powder with Nb2O5 films deposited by radio frequency sputtering
Deposition of various materials onto graphene without causing disorder in its structure is highly desirable for graphene applications. However, the deposition by means of radio frequency sputtering technique can degrade graphene structure because of interaction with high energy sputtered particles and gas species. By optimizing the deposition process parameters, the level of damage to graphene can be controlled. In this context, niobium pentaoxide (Nb2O5) films were deposited on multi layer graphene powder by radio frequency sputtering at different discharge powers (40-100 Watt). The structural properties of the prepared samples were studied using the X-ray diffraction (XRD) and Raman spectroscopy, while for the chemical analysis X-ray photoelectron spectroscopy (XPS) was used. It was found that the structural and chemical properties of deposited Nb2O5 and of the multi layers graphene are greatly dependent on discharge power.